The wide area irradiation optics were developed for singly charged ion implantation with beams of

max. 30 kV acceleration voltage, 10 mA beam current, and resulting energies of

up to 300 W irradiating targets of 200 mm width.

The first component of the setup is an electrostatic deflector for bending charged particle beams

by an angle of up to ±10°. It consists of an einzel-lens-like cylinder electrode separated

into two parts by a diagonal cut.

With this geometry, the two electrodes can deflect a beam by a certain deflection voltage,

i.e. a potential difference between the two electrode parts. Additionally, a lens effect can be

created by a superimposed offset or lens voltage applied to both electrode parts.

The second element is dipole magnet for beam parallelization after deflection.

It guarantees that the ion beam hits a potential target area parallel to the surface normal

with very small deviation angles under 1° over the entire beam scanning width of 200 mm.

Together with the specifically designed optical properties of the parallelization magnet,

this allows for very precise control of the ion beam implantation parameters of a facility containing

the Wide Area Irradiation Optics.

With this combined setup, the beam can be scanned over a target surface in one direction.

If the target is moved perpendicular to beam incidence and scanning direction a homogenious

ion implantation density can be achieved over a two dimensional area.

Large lens and magnet chamber dimensions as well as a replacable neutral beam dump allow for

transportation of high ion beam currents up to 10 mA at up to 20 keV with beam diameters of up to 40 mm,

as required for ion implantation purposes.

Although the recent design of the wide area irradiation optics was optimized for 200 mm target width,

the design principle can also be expanded to larger implantation areas.

The given figures demonstrate the functions of the electrostatic deector as well as

the parallelization magnet system.

The simulations were carried out using an ion beam virtually created by an electron cyclotron

resonance ion source.